Characterization of Defects and Stress in Polycrystalline Silicon Thin Films on Glass Substrates by Raman Microscopy

Figure 2

SEM images of SPC poly-Si (a) before and (b) after Secco etching for 60 s and (c) plan view TEM image of a grain.

(a) 0 s

(b) 60 s

(c)