Table of Contents
ISRN Dentistry
Volume 2011, Article ID 810565, 7 pages
http://dx.doi.org/10.5402/2011/810565
Research Article

Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations

Department of Restorative Dentistry, New Jersey Dental School, UMDNJ 110 Bergen Street, Newark, NJ 07103, USA

Received 18 April 2011; Accepted 9 May 2011

Academic Editors: G. Sjogren and C. G. Widmer

Copyright © 2011 Amy Shih et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Amy Shih, Robert Flinton, Jayalakshmi Vaidyanathan, and Tritala Vaidyanathan, “Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations,” ISRN Dentistry, vol. 2011, Article ID 810565, 7 pages, 2011. https://doi.org/10.5402/2011/810565.