Table of Contents
ISRN Condensed Matter Physics
Volume 2012, Article ID 293032, 7 pages
Research Article

Structural, Electrical, and Optical Properties of Reactively Sputtered Ag-Cu-O Films

Department of Physics, Sri Venkateswara University, Tirupati 517 502, India

Received 14 July 2012; Accepted 31 July 2012

Academic Editors: C. Bauerle, C. Homes, and A. N. Kocharian

Copyright © 2012 P. Narayana Reddy et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Thin films of silver-copper-oxide were deposited on glass substrates by RF magnetron sputtering of Ag80Cu20 target under various oxygen partial pressures in the range 5 × 1 0 3 8 × 1 0 2  Pa. The effect of oxygen partial pressure on the crystallographic structure and surface morphology and electrical and optical properties was systematically studied and the results were reported. The oxygen content in the films was correlated with the oxygen partial pressure maintained during the growth of the films. The films which formed at low oxygen partial pressure of 5 × 1 0 3  Pa were mixed in phase of Ag2Cu2O3 and Ag while those deposited at 2 × 1 0 2  Pa were grown with Ag2Cu2O3 and Ag2Cu2O4 phases. The films which formed at oxygen partial pressure of 2 × 1 0 2  Pa showed electrical resistivity of 2.3 Ωcm and optical band gap of 1.47 eV.