Research Article
Structural, Electrical, and Optical Properties of Reactively Sputtered Ag-Cu-O Films
Figure 4
AFM 3d- and 2d-micrographs of Ag-Cu-O films formed at different oxygen partial pressures: (a) 5 × 10−3 Pa, (b) 2 × 10−2 Pa, and (c) 5 × 10−2 Pa.
