Effect of Hydrogen Content and Bonding Environment on Mechanical Properties of Hydrogenated Silicon Films Deposited by High-Frequency PECVD Process

Figure 7

AFM micrographs of (a) sample A (𝐶_H = 3.9%) and (b) sample B (𝐶_H = 6.5%). Graph shows the variation of surface roughness with 𝐶_H%.