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ISRN Chemical Engineering
Volume 2012 (2012), Article ID 610510, 5 pages
Research Article

Optimization Study on Supercritical Electrodeposition of Nickel Nanowire Arrays Using AAO Template

Department of Applied Chemistry & Material Science, Fooyin University, 151 Chin-Hsueh Road, Ta-Liao Hsiang, Kaohsiung 831, Taiwan

Received 30 October 2012; Accepted 4 December 2012

Academic Editors: C. Chen, C. B. Coldeira, C. Perego, and A. M. Seayad

Copyright © 2012 Jau-Kai Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Highly ordered and nanometer-scaled nickel wire arrays were successfully prepared by supercritical electrodeposition method using anodized aluminum oxide (AAO) template. The results show that the well-ordered and free-standing nickel nanowire arrays can be constructed uniformly on a titanium-coated silicon wafer after removing the AAO template. The diameter and length of the nickel nanowire in the arrays can be obtained, about 100 nm and 10 um, respectively. Based on Box-Behnken design and Response Surface Methodology (RSM), a regression model was built by fitting the experimental results with a polynomial equation. The current density, pressure, and temperature are critical important factors of the growth mechanism of deposited nanowires. The optimal length of nanowires, 10.03 μm, can be achieved at the following conditions: current density 0.23 A/cm2, pressure 107 bar, and temperature 53°C.