Table of Contents
ISRN Nanotechnology
Volume 2012 (2012), Article ID 689023, 35 pages
Review Article

Advanced CMOS Gate Stack: Present Research Progress

1Department of Electrical and Electronic Engineering, Xi’an Jiaotong-Liverpool University, Suzhou, Jiangsu 215123, China
2Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3GJ, UK
3Department of Materials Science and Engineering, University of Liverpool, Liverpool L69 3GH, UK

Received 6 September 2011; Accepted 29 September 2011

Academic Editors: M. Cazzanelli and K. Yong

Copyright © 2012 Chun Zhao et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Chun Zhao, C. Z. Zhao, M. Werner, S. Taylor, and P. R. Chalker, “Advanced CMOS Gate Stack: Present Research Progress,” ISRN Nanotechnology, vol. 2012, Article ID 689023, 35 pages, 2012. doi:10.5402/2012/689023