Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films

Figure 5

AFM images of WO₃ films formed at oxygen partial pressures: (a) 4×10⁻² Pa, (b) 6×10⁻² Pa, and (c) 1×10⁻¹ Pa.

(a)

(b)

(c)