Table of Contents
ISRN Nanotechnology
Volume 2013, Article ID 271545, 4 pages
Research Article

Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films

Physics Department, Faculty of Science, KafrelSheikh University, KafrelSheikh 33516, Egypt

Received 26 February 2013; Accepted 31 March 2013

Academic Editors: G. Alfieri, D. K. Sarker, and J. J. Suñol

Copyright © 2013 A. El-Shaer and A. R. Abdelwahed. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Electrodeposition technique was employed to deposit cuprous oxide Cu2O thin films. In this work, Cu2O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2O thin films was investigated.