Table of Contents
ISRN Nanotechnology
Volume 2013, Article ID 368671, 5 pages
http://dx.doi.org/10.1155/2013/368671
Research Article

Resolution Improvement in Stage-Scanning Electron Holography: Comparison with Conventional Electron Holography

1Department of Materials Science and Engineering, Saitama Institute of Technology, 1690 Fusaiji, Fukaya, Saitama 369-0293, Japan
2Surface Physics and Structure Unit, National Institute for Materials Science, 3-13 Sakura, Tsukuba 305-0003, Japan
3Advanced Measurement and Analysis Center, Central Research Laboratory, Hitachi Ltd., Hatoyama, Saitama 350-0395, Japan
4Department of Materials Science and Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan
5Transmission Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba 305-0003, Japan

Received 13 May 2013; Accepted 26 June 2013

Academic Editors: I.-C. Chen, C. Malagù, and B. Pignataro

Copyright © 2013 Dan Lei et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Dan Lei, Kazutaka Mitsuishi, Ken Harada, Masayuki Shimojo, Dongying Ju, and Masaki Takeguchi, “Resolution Improvement in Stage-Scanning Electron Holography: Comparison with Conventional Electron Holography,” ISRN Nanotechnology, vol. 2013, Article ID 368671, 5 pages, 2013. https://doi.org/10.1155/2013/368671.