Research Article
Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering
Table 1
Deposition conditions fixed for the growth of CuNiO2 films.
| Sputter target | Cu50Ni50 | Target-to-substrate distance | 50 mm | Ultimate pressure | 5 × 10−4 Pa | Oxygen partial pressure (pO2) | 2 × 10−2 Pa | Sputtering pressure | 4 Pa | Substrate temperature | 523 K | Sputter power () | 3.1–6.1 W/cm2 |
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