Influence of Oxygen on Zinc Oxide Films Fabricated by Ion-Beam Sputter Deposition

<table>The XRD intensities, <svg height="12.4375" id="M109" style="vertical-align:-0.15048pt" version="1.1" viewbox="0 0 9.5625 12.4375" width="9.5625" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg>-spacings, and grain sizes of the ZnO-10 to -20 samples versus oxygen partial pressure.</table>

International Scholarly Research Notices

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Figure 9

Figure 9: Influence of Oxygen on Zinc Oxide Films Fabricated by Ion-Beam Sputter Deposition 