Table of Contents
ISRN Condensed Matter Physics
Volume 2013, Article ID 806374, 9 pages
Research Article

Growth of Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties

Department of Physics, Sri Venkateswara University, Tirupati 517 502, India

Received 18 June 2013; Accepted 28 July 2013

Academic Editors: K. Haenen and L. Pusztai

Copyright © 2013 S. Subbarayudu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Molybdenum oxide (MoO3) films were deposited on glass and silicon substrates held at temperature 473 K by RF magnetron sputtering of molybdenum target at various oxygen partial pressures in the range mbar. The deposited MoO3 films were characterized for their chemical composition, crystallographic structure, surface morphology, chemical binding configuration, and optical properties. The films formed at oxygen partial pressure of mbar were nearly stoichiometric and nanocrystalline MoO3 with crystallite size of 27 nm. The Fourier transform infrared spectrum of the films formed at mbar exhibited the characteristics vibrational bands of MoO3. The optical band gap of the films increased from 3.11 to 3.28 eV, and the refractive index increased from 2.04 to 2.16 with the increase of oxygen partial pressure from to mbar, respectively. The electrochromic performance of MoO3 films formed on ITO coated glass substrates was studied and achieved the optical modulation of about 13% with color efficiency of about 20 cm2/C.