Growth of MoO₃ Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties

Figure 5

FTIR spectra of MoO₃ films formed on silicon substrates at oxygen partial pressures: (a) 8×10⁻⁵ mbar, (b) 2×10⁻⁴ mbar (c) 4×10⁻⁴ mbar, and (d) 8×10⁻⁴ mbar.

(a)

(b)

(c)

(d)