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International Scholarly Research Notices
Table of Contents
International Scholarly Research Notices
/
2013
/
Article
/
Tab 1
/
Research Article
Growth of
Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties
Table 1
Sputter parameters fixed during the growth of the MoO
3
films.
Sputter target
Molybdenum (50 mm diameter and 3 mm thick)
Target to substrate distance
65 mm
Ultimate pressure
mbar
Oxygen partial pressure (pO
2
)
mbar
Substrate temperature (
)
473 K
Sputter pressure
mbar
Sputter power
150 W
Deposition time
120 min