Growth of MoO₃ Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties

Table 1

Sputter parameters fixed during the growth of the MoO₃ films.

Sputter target	Molybdenum (50 mm diameter and 3 mm thick)
Target to substrate distance	65 mm
Ultimate pressure	4×10^−6 mbar
Oxygen partial pressure (pO2)	8×10^−5--8×10^−4 mbar
Substrate temperature (𝑇s)	473 K
Sputter pressure	4×10^−2 mbar
Sputter power	150 W
Deposition time	120 min