Growth of MoO₃ Films by RF Magnetron Sputtering: Studies on the Structural, Optical, and Electrochromic Properties

Table 2

Chemical composition analysis of MoO₃ films analyzed by EDAX.

Oxygen partial pressure (mbar)	O; (at %)	Mo; (at %)	O/Mo
8×10^−5	72.4	27.6	2.62
2×10^−4	73.2	26.8	2.73
4×10^−4	74.8	25.2	2.97
8×10^−4	75.2	24.8	3.03