Carbon Based PV: n-Si(100)/DLC Structure for Photovoltaic Application

Figure 1

Field emission scanning electron micrograph (FESEM) of a DLC film deposited in a bath containing (a) 1.0% and (b) 8% (v/v) CH₃COOH on n-Si (100) substrates. Insets of (a) and (b) show the corresponding histograms. (c) XPS spectra of a representative film whose micrograph has been shown in (a).

(a)

(b)

(c)