Table of Contents
ISRN Metallurgy
Volume 2013, Article ID 930890, 6 pages
Research Article

Effects of Added Chloride Ion on Electrodeposition of Copper from a Simulated Acidic Sulfate Bath Containing Cobalt Ions

Amity School of Engineering and Technology, Amity University, Noida, Uttar Pradesh 201303, India

Received 14 November 2012; Accepted 18 December 2012

Academic Editors: M. Carboneras, M. Gjoka, and S. C. Wang

Copyright © 2013 Bijayalaxmi Panda. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The effects of added chloride ion on copper electrodeposition was studied using Pb-Sb anode and a stainless steel cathode in an acidic sulfate bath containing added Co2+ ion. The presence of added chloride ion in the electrolyte solution containing 150 ppm of Co2+ ion was found to increase the anode and the cell potentials and decrease the cathode potential. Linear sweep voltammetry (LSV) was used to study the effects of added chloride ion on the anodic process during the electrodeposition of copper in the presence of added  ppm; the oxygen evolution potential is polarised by adding 10 ppm chloride ion at current densities (≥150 A/m2), and further increase in chloride ion concentration increases the polarisation of oxygen evolution reaction more at higher current densities. X-ray diffraction (XRD) showed that added chloride ion and added Co2+ ion changed the preferred crystal orientations of the copper deposits differently. Scanning electron microscopy (SEM) indicated that the surface morphology of the copper deposited in the presence of added chloride ion and added Co2+ ion has well-defined grains.