Table of Contents
Journal of Coatings
Volume 2014, Article ID 905903, 11 pages
http://dx.doi.org/10.1155/2014/905903
Research Article

Hydrogenated Silicon Carbide Thin Films Prepared with High Deposition Rate by Hot Wire Chemical Vapor Deposition Method

1School of Energy Studies, University of Pune, Pune 411 007, India
2Department of Physics, Modern College, Pune 411 005, India
3UGC-DAE-CSR, University Campus, Khandawa Road, Indore 452 017, India
4Department of Physics, University of Pune, Pune 411 007, India

Received 28 April 2013; Revised 23 September 2013; Accepted 15 October 2013; Published 4 February 2014

Academic Editor: Mariana Braic

Copyright © 2014 M. M. Kamble et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

M. M. Kamble, V. S. Waman, A. H. Mayabadi, et al., “Hydrogenated Silicon Carbide Thin Films Prepared with High Deposition Rate by Hot Wire Chemical Vapor Deposition Method,” Journal of Coatings, vol. 2014, Article ID 905903, 11 pages, 2014. https://doi.org/10.1155/2014/905903.