Approach to the Highest HXR Yield in Plasma Focus Device Using Adaptive Neurofuzzy Inference System to Optimize Anode Configuration

Figure 8

The obtained HXR emission from different anode shapes using the proposed ANFIS network by 𝑉=13 kV, 70^∘<Φ₁ and Φ₂<90°, Φ₂<Φ₁, and (a) 𝑃=3 mbar, (b) 𝑃=4 mbar, (c) 𝑃=5 mbar, and (d) 𝑃=6 mbar.

(a)

(b)

(c)

(d)