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Journal of Materials
Volume 2013, Article ID 128986, 5 pages
http://dx.doi.org/10.1155/2013/128986
Research Article

Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

1Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam, Tamil Nadu 603102, India
2Department of Materials Engineering, Indian Institute of Science, Bangalore, Karnataka 560012, India
3President, PSG Institutions, Coimbatore, Tamil Nadu 641004, India

Received 19 November 2012; Accepted 13 December 2012

Academic Editor: Ram Gupta

Copyright © 2013 R. Krishnan et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

R. Krishnan, C. David, P. K. Ajikumar, et al., “Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties,” Journal of Materials, vol. 2013, Article ID 128986, 5 pages, 2013. https://doi.org/10.1155/2013/128986.