Journal of Materials / 2013 / Article / Fig 1

Research Article

Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

Figure 1

X-ray diffraction patterns of TiN films deposited at different nitrogen pressures. (*) and (S) denote peaks due to TiN and SS substrate, respectively.
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128986.fig.001b
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