Table of Contents
Journal of Materials
Volume 2013, Article ID 128986, 5 pages
Research Article

Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

1Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam, Tamil Nadu 603102, India
2Department of Materials Engineering, Indian Institute of Science, Bangalore, Karnataka 560012, India
3President, PSG Institutions, Coimbatore, Tamil Nadu 641004, India

Received 19 November 2012; Accepted 13 December 2012

Academic Editor: Ram Gupta

Copyright © 2013 R. Krishnan et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. J. E. Sundgren, “Structure and properties of TiN coatings,” Thin Solid Films, vol. 128, no. 1-2, pp. 21–44, 1985. View at Google Scholar · View at Scopus
  2. P. Ettmayer and W. Lenguer, “Transition metal nitrides: solid state chemistry,” in Encyclopedia of Inorganic Chemistry, R. B. King, Ed., John Wiley & Sons, 2nd edition, 1994. View at Google Scholar
  3. H. Randhawa, “Hard coatings for decorative applications,” Surface and Coatings Technology, vol. 36, no. 3-4, pp. 829–836, 1988. View at Google Scholar · View at Scopus
  4. C. Subramanian and K. N. Strafford, “Review of multicomponent and multilayer coatings for tribological applications,” Wear, vol. 165, no. 1, pp. 85–95, 1993. View at Google Scholar · View at Scopus
  5. I. N. Mihailescu, E. Gyorgy, N. Chitica et al., “A parametric study of the deposition of the TiN thin films by laser reactive ablation of titanium targets in nitrogen: the roles of the total gas pressure and the contaminations with oxides,” Journal of Materials Science, vol. 31, no. 11, pp. 2909–2915, 1996. View at Google Scholar · View at Scopus
  6. A. Perrone, “State-of-the-art reactive pulsed laser deposition of nitrides,” Japanese Journal of Applied Physics A, vol. 41, no. 4, part 1, pp. 2163–2170, 2002. View at Google Scholar · View at Scopus
  7. S. B. S. Heil, E. Langereis, F. Roozeboom, M. C. M. Van De Sanden, and W. M. M. Kessels, “Low-temperature deposition of TiN by plasma-assisted atomic layer deposition,” Journal of the Electrochemical Society, vol. 153, no. 11, Article ID 045611JES, pp. G956–G965, 2006. View at Publisher · View at Google Scholar · View at Scopus
  8. R. Krishnan, T. Mathews, A. K. Balamurugan et al., “Reactive pulsed laser deposition of titanium nitride thin film: optimization of process parameters using secondary ion mass spectrometry,” Applied Surface Science, vol. 256, no. 10, pp. 3077–3080, 2010. View at Publisher · View at Google Scholar · View at Scopus
  9. E. Rauhala, “Proton elastic scattering cross sections of carbon, nitrogen and silicon for backscattering analysis in the energy range 0.7–2.5 MeV,” Nuclear Instruments and Methods in Physics Research B, vol. 12, no. 4, pp. 447–452, 1985. View at Google Scholar · View at Scopus
  10. R. Krishnan, R. Ramaseshan, T. Mathews et al., “Synthesis of nanostructured titanium nitride films by PLD through reactive processing,” Surface Engineering, vol. 25, no. 3, pp. 218–222, 2009. View at Publisher · View at Google Scholar · View at Scopus
  11. E. D'Anna, M. L. De Giorgi, G. Leggieri et al., “Oxidation interference in direct laser nitridation of titanium: relative merits of various ambient gases,” Thin Solid Films, vol. 213, no. 2, pp. 197–204, 1992. View at Google Scholar · View at Scopus
  12. M. Mayer, SIMNRA User’s Guide, Report IPP 9/113, Max-Planck-Institut fur Plasmaphysik, Garching, Germany, 1997.
  13. Y. L. Jeyachandran, S. K. Narayandass, D. Mangalaraj, S. Areva, and J. A. Mielczarski, “Properties of titanium nitride films prepared by direct current magnetron sputtering,” Materials Science and Engineering A, vol. 445-446, pp. 223–236, 2007. View at Publisher · View at Google Scholar · View at Scopus
  14. S. Adachi and M. Takahashi, “Optical properties of TiN films deposited by direct current reactive sputtering,” Journal of Applied Physics, vol. 87, no. 3, pp. 1264–1269, 2000. View at Google Scholar · View at Scopus