Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties
Table 1
Composition of TiN thin films as measured using PEBS.
Deposition pressure (Pa)
1.0
0.44
0.56
3.0
0.82
0.18
5.0
0.90
0.10
7.0
0.76
0.24
10.0
0.59
0.41
We are committed to sharing findings related to COVID-19 as quickly as possible. We will be providing unlimited waivers of publication charges for accepted research articles as well as case reports and case series related to COVID-19. Review articles are excluded from this waiver policy. Sign up here as a reviewer to help fast-track new submissions.
