Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

Table 1

Composition of TiN thin films as measured using PEBS.

Deposition pressure 𝑃N2 (Pa)	NN/NTi	N0/NTi
1.0	0.44	0.56
3.0	0.82	0.18
5.0	0.90	0.10
7.0	0.76	0.24
10.0	0.59	0.41