Journal of Materials / 2013 / Article / Tab 1

Research Article

Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

Table 1

Composition of TiN thin films as measured using PEBS.

Deposition pressure (Pa)

1.00.440.56
3.00.820.18
5.00.900.10
7.00.760.24
10.00.590.41

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