Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

Table 2

Roughness of the films as measured from AFM.

Deposition pressure (Pa)	RMS roughness (nm)
1.0	1.9
3.0	2.2
5.0	6.6
7.0	4.5
10.0	4.3