Stoichiometry Control of ZnO Thin Film by Adjusting Working Gas Ratio during Radio Frequency Magnetron Sputtering
Figure 2
(a) Emission intensities originated from Ar (426 nm), O* (777 nm), (526 nm), and Zn (481 nm) and (b) emission intensity ratios of Zn/O* and O*/Ar as function of oxygen concentration.
