Recent Developments in the X-Ray Reflectivity Analysis for Rough Surfaces and Interfaces of Multilayered Thin Film Materials

Figure 13

X-ray reflectivity from a silicon wafer covered with a thin (10 nm) tungsten film with an rms surface roughness of 0.3 nm. Dashed line shows the calculated result by the theory in use prior to this work. Solid line shows the calculated result by the new calculation that considered the reduction in the sum intensity of reflective X-ray and refractive X-ray by diffuse scattering.