Direct Current Magnetron Glow Discharge Plasma Characteristics Study for Controlled Deposition of Titanium Nitride Thin Film

<table>Dependence of plasma density on magnetic fields at different probe positions. The total gas pressure is <svg height="16.049999" id="M22" style="vertical-align:-0.1638pt" version="1.1" viewbox="0 0 55.450001 16.049999" width="55.450001" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> Torr. Discharge voltage = 600 V.</table>

Journal of Materials

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Figure 3

Figure 3: Direct Current Magnetron Glow Discharge Plasma Characteristics Study for Controlled Deposition of Titanium Nitride Thin Film 