Table of Contents
Journal of Nanoscience
Volume 2014, Article ID 173845, 6 pages
Research Article

Microstructural and Electrochemical Properties of rf-Sputtered LiFeO2 Thin Films

Thin film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati–517 502, India

Received 15 August 2013; Revised 21 December 2013; Accepted 7 February 2014; Published 13 March 2014

Academic Editor: Vincent Jousseaume

Copyright © 2014 P. Rosaiah and O. M. Hussain. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Lithium iron oxide (LiFeO2) thin films have been deposited by rf-magnetron sputtering technique and microstructural and electrochemical properties were studied. The films deposited at a substrate temperature 250°C with subsequent post annealing at 500°C for 4 h exhibited cubic rock-salt structure with Fm3m space group. The films exhibited well-defined oxidation and reduction peaks suggesting complete reversibility upon cycling. The as-deposited films exhibited an initial discharge capacity 15  Ah/cm2· m, whereas the films post annealed at 500°C for 4 h in controlled oxygen environment exhibited 31  Ah/cm2· m.