Table of Contents
Laser Chemistry
Volume 16, Issue 3, Pages 157-166
http://dx.doi.org/10.1155/1996/60264

Multiphoton Dissociation of Phenylsilane Upon Excitation at 212.5 NM

Instituto de Química Física “Rocasolano”, CSIC, Serrano 119, Madrid 28006, Spain

Received 26 July 1995

Copyright © 1996 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Mohamed Oujja, Margarita Martín, Rebeca De Nalda, and Marta Castillejo, “Multiphoton Dissociation of Phenylsilane Upon Excitation at 212.5 NM,” Laser Chemistry, vol. 16, no. 3, pp. 157-166, 1996. https://doi.org/10.1155/1996/60264.