Table of Contents
Laser Chemistry
Volume 17 (1998), Issue 4, Pages 219-237
http://dx.doi.org/10.1155/1998/82640

Kinetic Study of the Reaction of Rh(a4F9/2) with N2O, O2 and NO

Chemistry Department, United States Naval Academy, Annapolis 21402, MD, USA

Received 21 January 1998

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

The gas phase reactivity of Rh(a4F9/2) with N2O, O2 and NO is reported. Removal rate constants for the excited states of rhodium below 13,000cm-1 are also reported. The reaction rate of Rh(a4F9/2) with N2O is relatively temperature insensitive. The rate constants for the bimolecular reaction are described in Arrhenius form by (1.3±0.3)×1012exp(1.3±0.8KJ/mol/RT)cm3s1 The reaction rates of the a4F9/2 state with O2 and NO are pressure dependent. For O2, the limiting low-pressure thirdorder, K0, and limiting high-pressure second-order, K, room temperature rate constants in argon buffer are (6.6±0.6)×1030cm6s1 and (2.1±0.2)×1011cm3s1, respectively. For NO, K2 and K are (1.3±0.2×1030cm6s1) and (2.1±0.4)×1011cm3s1, respectively. The removal rates of the excited states are faster than the ground state by a factor of 2 or more.