Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition

Figure 1

Scheme of a typical PLD setup for large-area “offset” film growth with the main functional components. The three fundamental process steps during (I) target ablation, (II) plasma expansion, and (III) film nucleation and growth are shortly described at the right. The “offset” distance has to be adjusted for laterally homogeneous films growth, as explained in Section 3 on large-area PLD.