Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition

Figure 35

AFM image of an STO thin film at 𝑇_sub≈700°C, p(O₂) = 0.002 mbar, and 𝐹≈1.9 J/cm² on a pre- treated STO (100) substrate. The thickness of the STO thin film is about 95 nm.