Research Article
Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography
Table 2
Major condition of small experimental light source.
| | | | Value | | | Unit | Setup 1 | Setup 2 | | Sn droplet | Diameter | m | 21 |
| | Pre pulse laser | Type of laser | | YAG laser | | Wave length | nm | 1064 | | Pulse width | sec. | 10 pico | 10 nano | | Pulse energy | mJ for 10 nsec. | max. 2.7 | | mJ for 10 psec. | max. 2.0 |
| | CO2 laser | Pulse width | nsec (FWHM) | 15 | | Pulse energy | mJ | 0–150 | | Spot size | m (l/e2) | 300 | | Plasma point | | Beam waist of CO2 laser |
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Laser pulse repetition rate | Hz | 2 |
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