Second-Order Nonlinear Optical Microscopy of a H–Si(111)1 × 1 Surface in Ultra-High Vacuum Conditions

Figure 12

Resonant SFG intensity images at 2084 cm⁻¹ of the H/Si(111) surface after heating for 10 s to several temperatures: (a) 592 K, (b) 625 K, (c) 666 K, (d) 728 K, and (e) 752 K. (f) A nonresonant SFG image at 2060 cm⁻¹ of the surface after heating to 744 K. Scale bars are 100 μm.

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