Table of Contents
Textures and Microstructures
Volume 14 (1991)–18

Texture Development in Thin Metallic Films

Center for Integrated Electronics Rensselaer Polytechnic Institute Troy, New York 12180-3590, USA

Copyright © 1991 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Aluminum films 1μm in thickness are deposited on SiO2/Si(100) by the self-ion assisted PIB technique and by sputtering. Texture analysis of the four deposition conditions reveals an {111} texture component superimposed on a random grain distribution. The relative fraction of the two components depends strongly on deposition conditions. Annealing at 400°C for 0.5 hr sharpens the {111} texture component at the expense of the random while inducing substantial grain growth where mean grain size increases by a factor of 3.5 to 5. One condition is truly a fiber texture, and the other three have textures with some deviation from axial symmetry.