Table of Contents
Textures and Microstructures
Volume 30, Issue 3-4, Pages 125-132

High Temperature Texture Goniometer for in Situ Measurements of Transformation Textures

Institut für Metallkunde und Metallphysik, RWTH Aachen, Kopernikus Str. 14, Aachen D-52074, Germany

Received 6 September 1996

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


A high temperature stage was designed for mounting onto a computer controlled four circle X-ray texture goniometer. This technique allowed to conduct in situ texture measurement, i.e. the determination of the texture evolution during rather than subsequent to annealing. The device was employed for temperatures up to 1000°C.

The furnace consisted of a resistance wire of Pt30Rh, which was isolated against the specimen with Al2O3 glue. The furnace with the specimen was covered by a hemispherical KaptonTM foil. Inside the hemisphere a reducing gas atmosphere was used to avoid oxidation of the sample surface.