Table of Contents
Textures and Microstructures
Volume 34 (2000), Issue 2-3, Pages 65-74
http://dx.doi.org/10.1155/TSM.34.65

Texture Analysis in LD-MOCVD Processed Thin Film Giant Magnetoresistant (LaM)MnO3 Materials

1MARTECH, Florida State University, Tallahassee, FL 32306-4351, USA
2Mechanical Engineering at FAMU-FSU College of Eng., Tallahassee, FL 3231, USA
3National High Magnetic Field Laboratory, Tallahassee, FL 32310, USA
4Departamento de Eng. Mecanica e de Materials, Rio de Janeiro, IME, Brazil

Received 8 October 1999

Copyright © 2000 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Thin films of La0.67M0.33MnO3 (M=Sr), LSMO were deposited on three different substrates of LAO, Sapphire, and Y-ZrO2 (YSZ) using metal–organic chemical vapor deposition methods. The effect of texture and orientation on the resistance (0 and 6T) and magnetoresistance (MR) of (LSMO) thin films on various substrates has been investigated. X-ray pole figures were measured using Philips X’Pert X-ray diffractometer equipped with the PopLa analysis package. A direct correlation was observed between the lattice mismatch strain and the structure of the thin film growth. LSMO/LAO seems to be the most perfect system for epitaxial growth due to the negligible lattice-mismatch (∼2%). The dominant orientation changes for the films deposited on LAO [100] and LAO [110] substrates while the transition temperature from ferromagnetic to paramagnetic state of the film on LAO [100] is 50 K higher than that of the film on LAO [100]. The MR data and TMI temperature were measured using standard 4-point resistivity devices and SQUID.