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VLSI Design
Volume 6 (1998), Issue 1-4, Pages 399-403
http://dx.doi.org/10.1155/1998/24073

The Combination of Equipment Scale and Feature Scale Models for Chemical Vapor Deposition Via a Homogenization Technique

1Department of Mathematics, Arizona State University, Tempe, AZ 85287-1804, USA
2Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287-6206, USA

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Matthias K. Gobbert, Timothy S. Cale, and Christian A. Ringhofer, “The Combination of Equipment Scale and Feature Scale Models for Chemical Vapor Deposition Via a Homogenization Technique,” VLSI Design, vol. 6, no. 1-4, pp. 399-403, 1998. doi:10.1155/1998/24073