M. Meyyappan, T. R. Govindan, "Plasma Process Modeling for Integrated Circuits Manufacturing", VLSI Design, vol. 6, Article ID 027636, 4 pages, 1998. https://doi.org/10.1155/1998/27636
Plasma Process Modeling for Integrated Circuits Manufacturing
A reactor model for plasma-based deposition and etching is presented. Two-dimensional results are discussed in terms of plasma density, ion flux, and ion energy. Approaches to develop rapid CAD-type models are discussed.
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