Table of Contents
VLSI Design
Volume 6, Issue 1-4, Pages 409-412
http://dx.doi.org/10.1155/1998/27636

Plasma Process Modeling for Integrated Circuits Manufacturing

Scientific Research Associates, Inc. P.O. Box 1058, Glastonbury 06033, CT, USA

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

M. Meyyappan and T. R. Govindan, “Plasma Process Modeling for Integrated Circuits Manufacturing,” VLSI Design, vol. 6, no. 1-4, pp. 409-412, 1998. https://doi.org/10.1155/1998/27636.