Review Article

Applications of Compact Laser-Driven EUV/XUV Plasma Sources

Figure 4

(a): Depths of EUV-generated ablation profiles in fused silica as a function of EUV pulse number for selected energy densities; (b): resulting ablation rates 𝑑 as a function of the applied EUV energy density 𝐻 ; the solid line represents the fit curve according to an ablation rate 𝑑 = 𝛼 e 1 l n ( 𝐻 / 𝐻 𝑡 ) ( 𝛼 e = e e c t i v e absorption coefficient, 𝐻 𝑡 = a b l a t i o n threshold energy density); inset: AFM image of fused silica, irradiated with 5 pulses at highest intensity ( 6 . 6 J / c m 2 ).
687496.fig.004a
(a)
687496.fig.004b
(b)