Applications of Compact Laser-Driven EUV/XUV Plasma Sources
Figure 8
Adaptable Kirkpatrick-Baez optics used for beam shaping, based on two cylindrical bent mirrors. Left: photograph and working principle (inset). Right: principle of mirror shaping (top), using bendable silicon wafers with a high reflectivity carbon coating for beam shaping (collimating/focusing). The resulting intensity distribution (bottom) of the focused beam shows diameters of (FWHM).