Cytotoxicity of Etch-and-Rinse, Self-Etch, and Universal Dental Adhesive Systems in Fibroblast Cell Line 3T3

Table 1

Test materials, classifications, and compositions.

Adhesive system (manufacturer)	Lot number	Classification	Composition
Adper Single Bond 2 (3M ESPE)	#N508311	Two-step etch-and-rinse	Bis-GMA, HEMA, polyacrylic acid, poly(itaconic acid), water, ethanol, dl-CQ, silica (10% wt).
Ambar (FGM)	#240215	Two-step etch-and-rinse	UDMA, HEMA, 10-MDP, hydrophilic methacrylated monomers, ethanol, silica nanofiller, photoinitiators, coinitiators, stabilizers.
Adper Scotchbond	Primer: #N560292	Three-step etch-and-rinse	Primer: HEMA, polyalkenoic acid polymer, water.
Multi-Purpose (3M ESPE)	Bond: #N551363		Bond: Bis-GMA, HEMA, tertiary amines, photoinitiator.
Scotchbond Universal (3M ESPE)	#569736	Two-step etch-and-rinse or one-step self-etch	Bis-GMA, HEMA, ethanol, water, silane treated silica, 2-propenoic acid 2-methyl-, reaction products with 1, 10-decanediol and phosphorous oxide (P2O5), copolymer of acrylic and itaconic acid, CQ, 4-dimethylaminobenzoate, toluene.
Ambar Universal (FGM)	#030815	Two-step etch-and-rinse or one-step self-etch	UDMA, HEMA, 10-MDP potentiated, hydrophilic methacrylated monomers, ethanol, silica nanofiller, photoinitiators, coinitiators, stabilizers.
OptiBond All-In-One (Kerr)	#5125872	One-step self-etch	GPDM, HEMA, GDMA, Bis-GMA, water, 2.5–3 acetone, ethanol, CQ, silica filler, sodium hexafluorosilicate.

Bis-GMA, bisphenol A diglycidyl methacrylate; HEMA, 2-hydroxyethyl methacrylate; CQ, camphorquinone; UDMA, urethane dimethacrylate; 10-MDP, 10-methacryloyloxydecyl dihydrogen phosphate; GPDM, glycerol phosphate dimethacrylate; GDMA, glycerol dimethacrylate.