Research Article
ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study
Table 1
RF sputtering conditions for deposition of ZnO films from ceramic targets.
| Deposition parameter | Conditions |
| R.F. power (WAr) | 200 W | Presputtering | 5 min before each deposition | Base pressure | 5 × 10−6 torr | Argon pressure (PAr) | 5 mtorr | Substrate temperature | Unheated and no control | Target-to-substrate distance | 11.5 cm |
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