ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study

<table class="table-group" id="tab3"><tr><td><table class="table"><tr><td class="thead-hr" colspan="3"><hr/></td></tr><tr class="thead"><td align="left">Film thickness (<i>μ</i>m)</td><td align="center">Powder blend (wt% Al<sub>2</sub>O<sub>3</sub>)</td><td align="center">Al in the film (wt%)</td></tr><tr><td class="thead-hr" colspan="3"><hr/></td></tr><tr><td align="left">0.1</td><td align="center">2</td><td align="center">0.5</td></tr><tr><td align="left">1.0</td><td align="center">4</td><td align="center">1.5</td></tr><tr><td align="left">2.0</td><td align="center">4</td><td align="center">2.5</td></tr><tr class="table-tr"><td colspan="3"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

EPMA analysis of composition of Al in coatings compared to that in powder target.

Advances in Condensed Matter Physics

tab3

Table 3

Table 3: ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study 