Structural and Optical Properties of Amorphous Al₂O₃ Thin Film Deposited by Atomic Layer Deposition

Table 1

EDS data of different cycles Al₂O₃ film on silicon wafer (oxygen, aluminum, and silicon (%); the total = 100%).

ALD cycles	Elements	Wt.%	At. (%)	(nm)	O/Al ratio
100	O	2.3	3.97	11.62	——
	Al	0	0
	Si	97.7	96.03
200	O	4.05	6.90	19.63	4.964029
	Al	1.38	1.39
	Si	94.57	91.71
300	O	5.85	9.82	30.95	5.223404
	Al	1.89	1.88
	Si	92.27	88.30
400	O	7.97	13.18	39.05	4.592334
	Al	2.93	2.87
	Si	89.1	83.95
500	O	11.23	18.15	50.40	5.385757
	Al	3.52	3.37
	Si	85.25	78.48