Advances in Condensed Matter Physics / 2018 / Article / Tab 1

Research Article

Structural and Optical Properties of Amorphous Al2O3 Thin Film Deposited by Atomic Layer Deposition

Table 1

EDS data of different cycles Al2O3 film on silicon wafer (oxygen, aluminum, and silicon (%); the total = 100%).

ALD cyclesElementsWt.%At. (%) (nm)O/Al ratio

100O2.33.9711.62——
Al00
Si97.796.03

200O4.056.9019.634.964029
Al1.381.39
Si94.5791.71

300O5.859.8230.955.223404
Al1.891.88
Si92.2788.30

400O7.9713.1839.054.592334
Al2.932.87
Si89.183.95

500O11.2318.1550.405.385757
Al3.523.37
Si85.2578.48