Research Article

Tuning Electronic Properties of GaSe/Silicane Van der Waals Heterostructure by External Electric Field and Strain: A First-Principle Study

Table 1

The formation energy (Ef) and interface distance (Δ) for the six stacking conformations.

ModelIIIIIIIVVVI

Ef/eV−0.855−0.838−0.838−0.856−0.857−0.856
Δ/Å3.2173.2333.2183.2333.1643.189