Substrate Temperature-Dependent Structural, Optical, and Electrical Properties of Thermochromic VO₂(M) Nanostructured Films Grown by a One-Step Pulsed Laser Deposition Process on Smooth Quartz Substrates

Table 1

The characteristics of the IMT of the PLD VO₂(M) films grown at different temperatures.

Substrate temperature (°C)	ΔR (orders of magnitude)	TIMT (°C)	ΔH (°C)	ΔT (°C)
				Heating	Cooling
450	3.184	72	8	5	7
550	2.718	75	11	6	10.
650	1.705	81	29	12	32